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15th Annual SOKUDO Lithography Breakfast Forum
"Double Patterning Challenges"

Date:       Wednesday, July 16, 2008
Location: Marriott San Francisco, Yerba Buena Salon 9
              55 Fourth Street (at Mission St. intersection)
              San Francisco, California
              http://www.marriott.com/hotels/travel/sfodt-san-francisco-marriott/

Program: 07:15am Breakfast & Poster Preview
              08:00am Forum Presentations
              10:00am Poster Session

This year's theme "Double Patterning Challenges" featured perspectives from semiconductor manufacturer AMD as well as lithography equipment (ASML, Nikon, Canon); materials (JSR, FujiFilm, AZ); coat/develop track (SOKUDO); and related double patterning process (Applied Materials) market players. Forum presentations were followed by a poster session and opportunity for individual question-and-answer engagement with company representatives.

For more details see on-line SEMICONDUCTOR INTERNATIONAL article "Double Patterning Battles Cost, Complexity" by Aaron Hand: http://www.semiconductor.net/article/CA6579281.html?industryid=47299

Presentation Files
Harry J. Levinson: AMD View Presentation (PDF:1.03MB)
Mark Slezak: JSR Micro View Presentation (PDF:1,812KB)
Glen Mori: SOKUDO View Presentation (PDF:1,317KB)
Chris Ngai: Applied Materials View Presentation (PDF:2,145KB)
Bob Socha: ASML View Presentation (PDF:1,570KB)
Chris Sparkes: Nikon View Presentation (PDF:439KB)

Annual Lithography Breakfast Forum
Presentations from Previous Forums
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Mark your calendars now for the...
16th Annual Sokudo Lithography Breakfast Forum
Wednesday, July 15th, 2009 at the San Francisco Marriott

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